Spectroscopic Ellipsometry (SE) for materials characterization at 193 and 157 nm

Authors: J. N. Hilfiker, F. G. Celii, W. D. Kim, E. A. Joseph, C. Gross, T. Y. Tsui, R. B. Willecke, J. L. Large, and D. A. Miller

Semiconductor Fabtech 17 (2002) 87-91.

New Frontiers for Spectroscopic Ellipsometry

Authors:  J. N. Hilfiker, T. E. Tiwald, and C. L. Bungay

Compound Semiconductor, 7 (2001) 76-80.

Spectroscopic Ellipsometry for Process Applications

Author:  J. N. Hilfiker and R. A. Synowicki

Solid State Technology, 39 (1996) 157-167.

Thin Film Metrology of Silicon on Insulator Materials

Authors: S. Zollner, T.-C. Lee, K. Noehring, A. Konkar, N. D. Theodore, W. M. Huang, D. Monk, T. Wetteroth, and S. R. Wilson, and J. N. Hilfiker

Appl. Phys. Lett., 76 (2000) 46-48.